Angaben zur Quelle [Bearbeiten]
| Autor | Sonia Oberoi |
| Titel | Synthesis and characterization of thin films of novel functionalised 2,5-Dithienylpyrrole derivatives on oxide substrates |
| Ort | Dresden |
| Jahr | 2005 |
| Anmerkung | Dissertation (Dr. rer. nat.) at the Faculty of Mathematics and Natural Sciences, Dresden University of Technology, Institute of Macromolecular and Textile Chemistry |
| URL | https://tud.qucosa.de/api/qucosa%3A24516/attachment/ATT-0/ , DNB |
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| Fußnoten | no |
| Fragmente | 3 |
| [1.] Bsi/Fragment 014 11 - Diskussion Zuletzt bearbeitet: 2024-05-21 20:30:26 WiseWoman | Bsi, Fragment, Gesichtet, KomplettPlagiat, Oberoi 2005, SMWFragment, Schutzlevel sysop |
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| Untersuchte Arbeit: Seite: 14, Zeilen: 11-31 |
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| The most common methods for the formation organic thin films can be grouped as “dry” and “wet” methods. Dry processes, which include: plasma assisted deposition, physical vapor deposition, and chemical vapor deposition, organic molecular beam epitaxy (OMBE) etc. are techniques that have been adapted from solid-state materials processing [Sch99], [Scho99]. Wet methods usually require amphiphilic and organic or water-soluble polymers and monomers. Spin-coating, solution casting and dip-coating are three of the most important wet processes [Fla84].
As outlined before important techniques that have gained significant interest for the last thirty years are molecular, macromolecular, and supramolecular wet assembly methods. These assemblies are defined as the application of solution or interfacial techniques at the molecular level where molecules or macromolecules are observed to self-assemble or form ordered monolayers at the range of less than one to less than several nanometers per layer. The advantage of this method is the potential to “tailor” layer ordering, thickness, and orientation at the molecular level on a monolayer basis with short and long range or covalent and non-covalent interactions. Subsequently, multilayers can be built on solid support substrates. A uniform microstructural arrangement at the nanometer level is critical to achieve adequate control of layer dimensions. Because these techniques involve adsorption (physisorption or chemisorption) in solution or at the air-water (solvent) interface, they are distinctly different from solvent casting and conventional vacuum evaporation deposition. [Fla84] Flack, W.W.; Soong, D.S.; Bell, A.T.; Hess, D.W. J. Appl. Phys. 1984, 56, 1199. [Sch99] Schwedhelm, R.; Schlomka, J. - P.; Woedtke, S.; Adelung, R.; Kipp, L.; Tolan, M.; Press, W.; Skibowski, M. Phys. Rev. B 1999, 59, 13394. [Scho99] Schön, J. H.; Kloc, C.; Batlogg, B. Science 2001, 293, 2432. |
[page 9]
2.1 A Brief Overview of Formation of Ultrathin Films The most common methods of formation organic thin films can be grouped as “dry” and “wet” methods. Dry processes, which include: plasma assisted deposition, physical vapor deposition, and chemical vapor deposition, organic molecular beam epitaxy (OMBE) etc. are techniques that have been adapted from solid-state materials processing [59, 60]. Wet methods usually require amphiphilic and organic or water-soluble polymers and monomers. Spin-coating, solution casting and dip-coating are three of the most important wet processes [61]. [...] An important technique that has gained significant interest for the last thirty years are molecular, macromolecular, and supramolecular wet assembly methods. These assemblies are defined as the application of solution or interfacial techniques at the molecular level where molecules or macromolecules are observed to self-assemble or form ordered monolayers at the range of less than one to less than several nanometers per layer. The advantage of this method is the potential to “tailor” layer ordering, thickness, and orientation at the molecular level on a monolayer basis with short and long range or covalent and non-covalent interactions. Subsequently, multilayers can be built on solid support substrates. A uniform microstructural arrangement at the nanometer level is critical to achieve adequate control of layer dimensions. Because these techniques [page 10] involve adsorption (physisorption or chemisorption) in solution or at the air-water (solvent) interface, they are distinctly different from solvent casting and conventional vacuum evaporation deposition. 59. R. Schwedhelm, J.-P. Schlomka, S. Woedtke, R. Adelung, L.Kipp und M. Skibowski, Phys. Rev. B 59, 1999, 13394. 60. J. H. Schön, C. Kloc und B. Batlogg, Science, 2001, 293, 2432; A. Koma, J. Cryst. Growth, 1999, 201-202, 236.
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| [2.] Bsi/Fragment 015 16 - Diskussion Zuletzt bearbeitet: 2024-05-21 20:35:28 WiseWoman | Bsi, Fragment, Gesichtet, Oberoi 2005, SMWFragment, Schutzlevel sysop, Verschleierung |
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| Untersuchte Arbeit: Seite: 15, Zeilen: 16-21 |
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| Depending on the structure of the surfactant, these films can be disordered (liquid-like) or well-packed, resembling the organization of crystals. The degree of order in a monolayer is the product of many factors, including geometric considerations, electrostatic and dipole-dipole interactions within the monolayer, affinity of the head group of the surfactant to the surface, etc. | Depending on the structure of the self-assembling molecules, these films can be disordered (liquid-like) or well-packed, resembling the organisation of crystals. The degree of order in a monolayer is a product of many factors, including electrostatic and dipole-dipole interactions within the monolayers, affinity of the head group to the surface. |
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| [3.] Bsi/Fragment 016 12 - Diskussion Zuletzt bearbeitet: 2024-05-21 20:38:35 WiseWoman | Bsi, Fragment, Gesichtet, KomplettPlagiat, Oberoi 2005, SMWFragment, Schutzlevel sysop |
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| Untersuchte Arbeit: Seite: 16, Zeilen: 12-14 |
Quelle: Oberoi 2005 Seite(n): 9, Zeilen: 17-19 |
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| Polymer spin coatings has been widely used in the microelectronics industry for fabrication of photolithographic and resist patterns but have limited applications for large areas displays. | Polymer spin coatings has been widely used in the microelectronics industry for fabrication of photolithographic and resist patterns but have limited applications for large areas displays. |
The source is not given. Both versions contain a grammar error: the subject is in plural but the verb is in singular. |
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