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| Untersuchte Arbeit: Seite: 22, Zeilen: 2-7, 8-10 |
Quelle: Lääniläinen 2006 Seite(n): 6, Zeilen: 10-15 |
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| Bottom-up and top down approach
Micro- and nanostructures are usually patterned by photolithography and etching, based on removal of material, so called top-down approach. These techniques are highly developed and widespread. They have their limitations, however. The patterning of nanoscale dimensions means higher equipment cost with conventional techniques, and going to smaller dimensions requires scanning beam serial techniques, which have a low throughput. Nanotechnology requires lithography techniques with improved resolution down to the sub-100 nm scale. The unconventional techniques provide an alternative way to fabricate small structures. |
1.3 Alternative Lithographies
Micro- and nanostructures are usually patterned by photolithography and etching, based on removal of material, so called top-down approach. These techniques are highly developed and widespread. They have their limitations, however. The patterning of nanoscale dimensions means higher equipment cost with conventional techniques, and going to smaller dimensions requires scanning beam serial techniques, which have a low throughput. The unconventional techniques provide an alternative way to fabricate small structures. |
Though identical nothing has been marked as a citation. |
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